| 摘要 |
<p>PURPOSE:To improve the accuracy of alignment and to obtain improved quality by coating a prescribed pattern with a liq. contg. a dispersed photosensitive pigment except the alignment arc parts. CONSTITUTION:A glass substrate 4 with a formed prescribed pattern including alignment arcs 1 and a color filter 2 is coated with a liq. 3 contg. a dispersed photosensitive pigment by means of a coater having noncoating regions, e.g. a roll coater. The region of the color filter 2 for forming a pattern by photolithography is coated with the liq. 3 in a nearly uniform film thickness but a coating film of the liq. 3 is not formed on the alignment arcs 1 because the regions of the arcs 1 are noncoating regions at the time of coating. Hindrance to the confirmation of the arcs 1 by the absorption of transmitted light in the liq. 3 can be avoided at the time of alignment before exposure in a producing stage.</p> |
