| 摘要 |
PURPOSE: A spinner apparatus having nozzles for supplying chemical and a method for forming a pattern and a method for etching using the same are provided to improve the uniformity of critical dimension(CD) in a pattern formed on a wafer by arranging a plurality of nozzles for supplying chemical on the wafer respectively and controlling independently the temperature of the chemical and the quantity of flow for each nozzle. CONSTITUTION: A spinner apparatus comprising a rotator, a plurality of nozzles(22, 24, 26, 28) for supplying chemical and a plurality of tubes(52, 54, 56, 58) for supplying chemical. A photo mask(20) for performing a developing process is clamped on a fixed chuck(84) of a process-performing unit(70) at level. The fixed chuck(84) rotates at regular speed by a shaft(82) which is rotated by a motor(80). The nozzles(22, 24, 26, 28) for supplying chemical are placed on the photo mask(20). A developing solution stored in a chemical source(40) is supplied to the nozzles(22, 24, 26, 28) for supplying chemical independently via the tubes(52, 54, 56, 58) for supplying chemical. |
