| 摘要 |
PROBLEM TO BE SOLVED: To provide a new method for depositing a microperiodic structure in which, by devising a general deopsition method, the degree of freedom in the deposition method is expanded as possible, and utilization for magnetic and optical memories and optical elements is made possible. SOLUTION: In a thin film deposition method in which a mask 1 having periodicity of <=1 micron is deposited on a substrate 2, and a thin film 3 having periodicity corresponding to the periodicity of the mask 1 is deposited on the substrate 2 by vapor deposition, the vapor deposition is performed at an angle oblique to the substrate 2 so that the vapor deposition to the side wall part of the mask 1 is promoted to improve the perpendicularity of the thin film 3.
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