| 摘要 |
<p>A positive photoresist composition comprising an admixture of a photosensitizer comprising a diazo ester of a 2,3,4,4 min -tetrahydroxybenzophenone, wherein the hydroxy groups of said tetrahydroxybenzophenone have been esterified with a diazo sulfonyl chloride consisting essentially of from about 50 to 100 mole percent 2,1,4-diazo sulfonyl chloride and from 0 to about 50 mole percent 2,1,5-diazo sulfonylchloride, the photosensitizer being present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; and a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition.</p> |
