| 摘要 |
PROBLEM TO BE SOLVED: To obtain a positive type photosensitive composition which ensures enhanced dissolution discrimination between non-image and image parts, has high sensitivity and high resolving power, causes no problem on development defects and has excellent density dependency. SOLUTION: The positive type resist composition contains (A) a resin which is decomposed by the action of acids to have its solubility in an alkali developing solution increased, (B1) at least one compound which has two or more sulfonium cation structures in one molecule and generates an acid when irradiated with active light or radiation and (B2) at least one compound which has a bis(sulfonyl) diazomethane structure and generates an acid when irradiated with active light or radiation. |
