发明名称 NEW RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To obtain a resin composition which has excellent light resistance, excellent thermal aging resistance and excellent processability by formulating a specific polyglycerol derivative or the like, a UV light absorber or the like, and a resin. SOLUTION: This resin composition comprises (A) at least one compound selected from a polyglycerol derivative wherein at least one of the hydroxyl groups of the polyglycerol molecule is esterified with a fatty acid, an N-acyl basic amino acid, and a dibasic acid erythritol ester preferably a compound of the formula [R1 is methyl, ethyl or methylol; (n) is 0 to 5], (B) a UV light absorbent (preferably a benzotriazole-based UV light absorber) and/or a radical trapper (preferably a hindered amine-based radical trapper), (C) a resin (preferably a thermoplastic resin), and preferably further (D) a filler.
申请公布号 JP2000319520(A) 申请公布日期 2000.11.21
申请号 JP19990133766 申请日期 1999.05.14
申请人 AJINOMOTO CO INC 发明人 YASUDA NAOKI;TANAKA SUKEYUKI
分类号 C08L101/00;C08K5/103;C08K5/16;(IPC1-7):C08L101/00 主分类号 C08L101/00
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