| 摘要 |
PROBLEM TO BE SOLVED: To provide a power source system for a plasma process device which does not necessitate extra complicated work to match, is easy to handle, reduces matching time, uniforms plasma and improves uniformity and reproducibility of thickness of film generated. SOLUTION: In a plasma process device equipped with a plurality of U-shaped electrodes having an end for power supply and the other end for earth potential, output of a plasma generating power supply for VHF band is distributed and supplied to a plurality of power supply ends of U-shaped electrodes using a distributor from a power supply. Impedance matching with loading plasma can be abbreviated by a matching equipment or the like supplying distributed output through an isolator, and also, phases can be controlled by a phase shifter. |
