发明名称 Thin film transistor and method for fabricating the same
摘要 A thin film transistor includes a substrate with a trench having first and second sides and a bottom, and a gate electrode at one of the first and second sides of the trench. The thin film transistor further includes a gate insulating layer on the entire surface of the substrate including the gate electrode, and an active layer on the gate insulating layer along the trench, the active layer having source and drain regions substantially outside the trench.
申请公布号 US6008505(A) 申请公布日期 1999.12.28
申请号 US19980204541 申请日期 1998.12.03
申请人 LG SEMICON CO., LTD. 发明人 CHO, SEOK-WON
分类号 H01L21/336;H01L29/786;(IPC1-7):H01L29/786 主分类号 H01L21/336
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