Micro-chamber array formed by anisotropic etching e.g. for biotechnology applications
摘要
The array has a number of chambers with a high packing density formed in the surface of a silicon substrate (2) via anisotropic etching of the areas of the substrate between the chamber coated with a thin Au layer (31), overlaid by a functional surface coating (32). The inside walls (10) of the chambers are provided with a second functional surface coating (12), with an opposite effect to the first functional surface coating.
申请公布号
DE19705910(C1)
申请公布日期
1998.06.18
申请号
DE19971005910
申请日期
1997.02.15
申请人
INSTITUT FUER PHYSIKALISCHE HOCHTECHNOLOGIE E.V., 07743 JENA, DE