| 摘要 |
The invention relates to an ion implanter which comprises at least one component of a refractory metal of the group W, W alloy, Mo and Mo alloy. The surface of said component comprises, at least in sections, a layer that is formed, at least in sections, by at least one compound formed by at least one element selected from the group consisting of C, B and N combined with at least one element selected from the group consisting of W and Mo. |
