APPARATUS OF REMOVING PHOTORESIST MATERIAL FROM SEMICONDUCTOR WAFER

摘要

PURPOSE: An apparatus of removing photoresist material from a semiconductor wafer is provided to improve contact between a lamp and an electrode. CONSTITUTION: The apparatus includes a bowl(16) for focusing light, a lamp housing(13) and a wafer chuck(11) comprising a protrusion part(20). The lamp housing(13) has a socket(18). The lamp(12) is inserted into the socket(18) to firmly attach. So, it can maintain tightly the contact between the terminal(17) of the lamp and the electrode.