发明名称 Thermal direct master
摘要 A thermal direct master for lithography, which comprises a water-resisting substrate and a thermosensitive recording layer formed thereon, which comprises as the main components an inorganic pigment, a binder agent, a thermofusible material and a hydrophilic modified silicon oil. The above-mentioned hydrophilic modified silicon oil may be selected from the group consisting of a carboxyl-modified silicone oil, an alkyl higher alcohol eseter modified silicone oil, an alcohol-modified silicone oil, polyether-modified silicon oil, and an alpha -olefin modified silicone oil.
申请公布号 US4974513(A) 申请公布日期 1990.12.04
申请号 US19890379365 申请日期 1989.07.13
申请人 RICOH COMPANY, LTD. 发明人 YAMANE, SHIRO;ARAI, FUMIAKI
分类号 B41C1/10;B41N1/14 主分类号 B41C1/10
代理机构 代理人
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