发明名称 MIXED CONTACT INTERLAYER AND USING METHOD THEREOF
摘要 The present invention relates to a mixed contact interlayer which includes an electron injection element and a hole injection element, a manufacturing method thereof, and a method for successively controlling the work function of a metal electrode by using the mixed contact charge injection layer in transferring the positive carrier of an organic semiconductor device.
申请公布号 KR20160083749(A) 申请公布日期 2016.07.12
申请号 KR20150000262 申请日期 2015.01.02
申请人 LG ELECTRONICS INC. 发明人 KIM, HYUN CHUL;NOH, YONG YOUNG;PARK, DAE HYUN;LEE, MYUNG WON;MIN, SOON YOUNG
分类号 H01L51/10;H01L51/00 主分类号 H01L51/10
代理机构 代理人
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