HEATER FOR HEAT TREATMENT OF SUBSTRATE AND SUBSTRATE HEAT TREATMENT APPARATUS USING IT

摘要

The present invention relates to a heater supplying heat to perform thermal treatment on a substrate, and a thermal treatment device using the same. The heater includes: an inner pipe; an inner heat line placed inside the inner pipe; an outer pipe surrounding the inner pipe as separated from the outer surface of the inner pipe; an outer heat line wound around the outer surface of the inner pipe; and a shape keeping member making at least one from the inner and outer heat lines formed in a coil shape, and keeping the shape of a heat line between pitches of one from the inner and outer heat lines. Therefore, the present invention is capable of uniformly heating a substrate by separately controlling caloric values of an edge part and a central part of the heater, and preventing the transformation of a heater pipe and a coil shape of the heat lines by including a support member and a shape keeping member.