| 摘要 |
A method of fabricating a multi-tone amplitude photomask (50) includes providing a mask substrate (24). The method includes providing a stepped pattern in at least one layer (20a, 20b) of material on a surface of the mask substrate. The stepped pattern includes at least two steps and at least three levels (42, 44, 48). Each level of the stepped pattern provides a different intensity of light when a light source shines light on the stepped pattern. |
