发明名称 Sputter coating source
摘要 Sputter coating source in which the target is mounted directly on the front side of the cathode and coolant is circulated on the back side of the cathode. The coolant does not contact the target, and the target is clamped tightly to the cathode by retainers which permit it to be removed and replaced easily without leakage of coolant.
申请公布号 US5180478(A) 申请公布日期 1993.01.19
申请号 US19900633586 申请日期 1990.12.19
申请人 INTEVAC, INC. 发明人 HUGHES, JOHN L.
分类号 C23C14/34;H01J37/34 主分类号 C23C14/34
代理机构 代理人
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