发明名称 DUV light source optical element improvements
摘要 A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed with a fast angularly positionable mirror having a mirror mounting frame, a reflective optic with a coefficient different from that of the mounting frame, at least one flexure mount fromed in the mounting frame that is flexible having flexure arm attached the flexture to the mounting frame. The apparatus may include a flexure force mechanism having an elongated rod. The force mechanism may pre-stress the flexure. The mirror maybe a grating which includes a substrate with metallic layer formed on the substrate, and a protective coating made of silica formed on the reflective metallic layer. The grating maybe actively tuned using an electro- or magneto-sensitive element. Oxides of the metal in the reflective layer may be removed by a hydrogen purge system exposed to deep ultraviolet radiation.
申请公布号 US7346093(B2) 申请公布日期 2008.03.18
申请号 US20040808157 申请日期 2004.03.23
申请人 CYMER, INC. 发明人 SANDSTROM RICHARD L.;ALGOTS JOHN MARTIN;BROWN JOSHUA C.;CYBULSKI RAYMOND F.;DUNLOP JOHN;HOWEY JAMES K.;MORTON RICHARD G.;PAN XIAOJIANG;PARTLO WILLIAM N.;PUTRIS FIRAS F.;WATSON TOM A.;YAGER THOMAS A.
分类号 H01S3/08;G01B9/02;G01J1/42;G01J9/02;G03F7/20;H01S3/00;H01S3/036;H01S3/038;H01S3/04;H01S3/041;H01S3/081;H01S3/097;H01S3/0971;H01S3/0975;H01S3/10;H01S3/102;H01S3/104;H01S3/105;H01S3/1055;H01S3/11;H01S3/13;H01S3/134;H01S3/139;H01S3/22;H01S3/223;H01S3/225;H01S3/23 主分类号 H01S3/08
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