发明名称 Oximsulfonzuuresters en de toepassing daarvan als latente sulfonzuren.
摘要 <p>The invention relates to the use of oximesulfonic acid esters of formula I m is 0 or 1 and x is 1 or 2; R1 is, for example, substituted phenyl, R2 has, for example, one of the meanings of R1 or is unsubstituted phenyl, C1-C6alkanoyl, unsubstituted or substituted benzoyl, C2-C6alkoxycarbonyl or phenoxycarbonyl; or R1 and R2, if necessary together with the CO group, form a ring, R3, when x is 1, is, for example, C1-C18alkyl, phenyl or phenanthryl, the radicals phenyl and phenanthryl being unsubstituted or substituted, or R3, when x is 2, is, for example, C2-C12alkylene, phenylene or oxydiphenylene, the radicals phenylene and oxydiphenylene being unsubstituted or substituted, as latent acid donors, especially at wavelengths over 390 nm, and to the use of the compounds in the production of photoresists.</p>
申请公布号 NL1004387(C2) 申请公布日期 1998.05.19
申请号 NL19961004387 申请日期 1996.10.30
申请人 CIBA SPECIALTY CHEMICALS HOLDING INC. 发明人 KURT DIETLIKER;MARTIN KUNZ
分类号 A61K6/00;C07C309/64;C07C309/66;C07C309/72;C07C309/73;C07C309/75;C07C323/62;C07C381/00;C07D311/18;C08F2/46;C08F2/50;C09D11/03;C09D11/101;C09D161/20;C09D161/28;G03F7/004;G03F7/038;G03F7/039;H01L21/027;(IPC1-7):C07C309/72;C07C323/63;C07D311/16;C07D521/00;C07C309/65;C08K5/42;C07C323/47 主分类号 A61K6/00
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