METHOD AND APPARATUS FOR MEASURING WAVEFRONT ABERRATIONS

摘要

An apparatus and method for measuring wavefront aberrations. A beam splitter separates the aberrated wavefront into two components, mirror arrays focus each of the components to a plurality of discrete lines with the discrete lines of one component having a different orientation than the discrete lines of the other component, and an imaging device detects the discrete lines to determine wavefront aberrations. The method includes separating the wavefront into two components, focusing each of the components into a plurality of discrete lines with the discrete lines of one component having a different orientation than the discrete lines of the other component, and detecting information related to the discrete lines.