ION BEAM SPUTTERING APPARATUS, ION BEAM SPUTTERING METHOD, AND ION GUN

摘要

PROBLEM TO BE SOLVED: To enable an ion gun to be stably operated for a long period of time by preventing the occurrence of abnormal discharge. SOLUTION: In the ion beam sputtering apparatus for depositing an insulating thin film on a substrate by irradiating a target with ion beams from an ion gun, a conductive target 31 is arranged at the position where a part of the ion beams are emitted, and a conductive film is deposited on a grid 22 of the ion gun 13 by particles sputtered out from the conductive target 31. Thick deposition of an insulating film on the grid 22 can be prevented, and charge-up of the insulating film can be suppressed. COPYRIGHT: (C)2007,JPO&INPIT