| 摘要 |
A pulse electrothermal deicing apparatus comprises at least one complex shape ( 40(2), 40(3), 40(4) ) characterized by a thickness profile configured to generate uniform power per unit area to melt an interfacial layer of ice. A method of optimizing thicknesses of complex shapes for a pulse electrothermal deicing system includes assigning initial estimates of the pulse electrothermal deicing system parameters. A temperature distribution, a temperature range and a refreezing time produced by a deicing pulse are modeled. Shape thicknesses are adjusted according to the temperature range, deicing pulse parameters are adjusted according to the deicing pulse, and the modeling and adjusting is repeated until the temperature range and the refreezing time are within predetermined limits.A pulse electrothermal deicing apparatus comprises at least one complex shape ( 40(2), 40(3), 40(4) ) characterized by a thickness profile configured to generate uniform power per unit area to melt an interfacial layer of ice. A method of optimizing thicknesses of complex shapes for a pulse electrothermal deicing system includes assigning initial estimates of the pulse electrothermal deicing system parameters. A temperature distribution, a temperature range and a refreezing time produced by a deicing pulse are modeled. Shape thicknesses are adjusted according to the temperature range, deicing pulse parameters are adjusted according to the deicing pulse, and the modeling and adjusting is repeated until the temperature range and the refreezing time are within predetermined limits. |
