LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRAPHIC METHOD

摘要

A lithographic apparatus and programmable patterning device is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a plurality of VECSELs or VCSELs. The projection system may include a zone plate array that is oscillated in a Lissajous pattern. The zone plate array may include lenses arranged in a two-dimensional array where the lenses are arranged in a triangular layout. A lithographic system may include a plurality of the lithographic apparatuses, at least one lithographic apparatus being arranged above another lithographic apparatus.

主权项

1. A lithographic apparatus comprising:
a substrate holder constructed to hold a substrate; a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern, the modulator comprising a plurality of VECSELs or VCSELs to provide the plurality of beams; and a projection system configured to project the modulated beams onto the substrate.