发明名称 MANUFACTURING METHOD OF PHOTOELECTRIC CONVERSION APPARATUS
摘要 A method of manufacturing a photoelectric conversion apparatus includes forming a switching element on one surface of a substrate, forming an interlayer insulation film so as to cover the switching element, forming a shading film on the interlayer insulation film in an area overlapping the switching element when seen from a film thickness direction of the substrate, forming a lower electrode on the interlayer insulation film, and forming a semiconductor film having a chalcopyrite structure on the lower electrode. A group 16 element is included in the semiconductor film, and in forming the semiconductor film, the shading film and the lower electrode are caused to react to the group 16 element to form a shading film including the group 16 element and a lower electrode including the group 16 element.
申请公布号 US2016233268(A1) 申请公布日期 2016.08.11
申请号 US201615131780 申请日期 2016.04.18
申请人 SEIKO EPSON CORPORATION 发明人 JIROKU Hiroaki
分类号 H01L27/146 主分类号 H01L27/146
代理机构 代理人
主权项 1. A method of manufacturing a photoelectric conversion apparatus, comprising: forming a switching element on one surface of a substrate; forming an interlayer insulation film so as to cover the switching element; forming a shading film on the interlayer insulation film in an area overlapping the switching element when seen from a film thickness direction of the substrate; forming a lower electrode on the interlayer insulation film; and forming a semiconductor film having a chalcopyrite structure on the lower electrode, wherein a group 16 element is included in the semiconductor film, and in forming the semiconductor film, the shading film and the lower electrode are caused to react to the group 16 element to form a shading film including the group 16 element and a lower electrode including the group 16 element.
地址 Tokyo JP