发明名称 METHOD FOR MANUFACTURING MICROLENS ARRAY SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a novel method for manufacturing a microlens array substrate on which microlens faces each with a concave surface are array-arranged.SOLUTION: A method for manufacturing a microlens array substrate includes: a thin film for mask formation step S1 for forming a thin film 12 for a mask on a formation surface on which an array arrangement of microlens faces is formed, of a substrate 10; an imprint resin layer formation step S2 for forming an imprint resin layer 14 on the thin film 12 for the mask; a patterning step S3 for patterning the imprint resin layer 14 using an imprint mold 16; a pattern boring step S4 for carrying out dry etching for the thin film 12 for the mask with an imprint resin layer 14A after patterning as the mask and boring an open array pattern; a wet etching step S5 for carrying out wet etching for the substrate 10 with a thin film 12A for a mask after boring as a mask and forming an array arrangement MLAS of microlens faces ML; and a removal step S6 for removing residues remaining after the wet etching step.SELECTED DRAWING: Figure 2
申请公布号 JP2016109815(A) 申请公布日期 2016.06.20
申请号 JP20140246139 申请日期 2014.12.04
申请人 RICOH INDUSTRIAL SOLUTIONS INC 发明人 SUGITA MANABU
分类号 G02B3/00;B29C33/38;B29C59/02 主分类号 G02B3/00
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