发明名称
摘要 PROBLEM TO BE SOLVED: To appropriately maintain the treatment condition of a water system by performing water treatment according to the potential change in a sensor, pouring a chemical using a chemical-pouring pump when the potential of the sensor reaches a threshold, and pouring the chemical only by the pump when the potential decreases to a normal value. SOLUTION: Water in a cooling tower 20 with a cooling fan 18 and a pit 19 is sent to a heat exchanger 23 via a water-feeding pump 21 and water-feeding piping 22, and is circulated to the cooling tower 20 via return piping 24. Piping 25 for sampling water is branched from the water-feeding piping 22, sampled water passes through the inside of a test pipe 26, and then is returned to the cooling tower 20 or the piping 22 and 24. The test pipe 26 is provided with a sensor 11 and a reference electrode 12, and the signals of the sensor 11 and the electrode 12 are inputted to measurement control equipment 13. The potential of the sensor 11 is measured with the electrode 12 as a reference in the control equipment 13. When the sensor 11 does not detect any tendency of deposit of contamination, a chemical is poured only by a pump 15 for pouring the chemical. On the other hand, when the sensor 11 detects the tendency of the deposit of contamination, the chemical is poured from both of the pumps 15 and 17, thus performing strong slime suppression treatment.
申请公布号 JP3518463(B2) 申请公布日期 2004.04.12
申请号 JP20000035544 申请日期 2000.02.14
申请人 发明人
分类号 C02F1/50;G01N27/26;G01N27/416;G01N33/18 主分类号 C02F1/50
代理机构 代理人
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