发明名称 MASK, COLOR FILTER SUBSTRATE, METHOD FOR MANUFACTURING COLOR FILTER SUBSTRATE, ELECTROOPTICAL DEVICE, METHOD FOR MANUFACTURING ELECTROOPTICAL DEVICE AND ELECTRONIC EQUIPMENT
摘要 <P>PROBLEM TO BE SOLVED: To reduce a phenomenon that the color of display is changed in accordance with an observation angle in the case of performing color display by forming a plurality of recessed parts or projecting parts on the surface of a light reflection layer and scattering reflected light. <P>SOLUTION: The mask has a plurality of apertures 4 for forming a plurality of projecting parts or recessed parts on the surface of the light reflection layer provided oppositely to a coloring layer 28 containing coloring elements 6 having a different color. The size of individual apertures 4 existing in an area corresponding to coloring elements 6 having the same color and area density in the respective areas are the same each other. Meanwhile, the size of individual apertures 4 existing in an area corresponding to the coloring elements 6 having the different color and/or the area density in the respective areas is different among the areas. When a recessed and projecting pattern is formed on the surface of the reflection layer by using the mask 1 and display is performed by reflecting the light by the reflection layer, the display can be corrected so that the angle dependency of scattered light transmitted through the respective coloring elements 6 may be the same between the coloring elements 6, whereby the phenomenon that the color of the display is changed in accordance with the observation angle is reduced. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005049581(A) 申请公布日期 2005.02.24
申请号 JP20030280854 申请日期 2003.07.28
申请人 SEIKO EPSON CORP 发明人 OTAKE TOSHIHIRO;NAKANO TOMOYUKI
分类号 G02B5/02;G02B5/08;G02B5/20;G02F1/1335;G03F1/52;G03F1/68;G03F1/70;G09F9/30 主分类号 G02B5/02
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