MEASUREMENT METHOD OF ILLUMINANCE IRREGULARITIES OF ALIGNER, CORRECTION METHOD OF ILLUMINANCE IRREGULARITIES, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND ALIGNER

摘要

PROBLEM TO BE SOLVED: To restrain illuminance irregularities inside a batch exposure region of a projection aligner. SOLUTION: In an aligner constituted of an illuminating optical system 1 and a projection optical system 4, the average of transmittances of all the paths, which beam flux relating to imaging of arbitrary one point inside a limited region on a photosensitive substrate passes, is calculated each in a plurality of points of a limited region on the photosensitive substrate, and illuminance irregularities inside the limited region on the photosensitive substrate is obtained.