Salt, photoresist composition and method for producing photoresist pattern

摘要

A salt represented by formula (I):;
wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group,
A1 represents a C1-C30 monovalent organic group,X1 represents a C1-C10 aliphatic hydrocarbon group where a hydrogen atom may be replaced by a hydroxy group,m1 and m2 independently each represent an integer of 1 to 4, andZ+ represents an organic cation.

主权项

1. A photoresist composition, which comprises a salt represented by formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, A1 represents a C3-C30 alicyclic hydrocarbon group in which a hydrogen atom may be replaced by a hydroxy group or a halogen group and in which a methylene group may be replaced by an oxygen atom, a sulfonyl group or a carbonyl group, X1 represents a C1-C10 aliphatic hydrocarbon group where a hydrogen atom may be replaced by a hydroxy group, m1 and m2 independently each represent an integer of 1 to 4, and Z+ represents an organic cation, a resin which is hardly soluble or insoluble but soluble in an aqueous alkali solution by action of an acid, and a resin having a structural unit represented by formula (FI): wherein RF1 represents a hydrogen atom or a methyl group, AF1 represents a C1-C6 alkanediyl group, and RF2 represents a C1-C10 hydrocarbon group having a fluorine atom.