发明名称 Lithographic apparatus, device manufacturing methods, and computer-readable storage medium
摘要 The change in a property of a lithographic apparatus, in a preferred embodiment the change in magnification of the projection system due to lens heating effects, is predicted and when the change since the last time an alignment process was performed is greater than a threshold, an additional alignment process is carried out. A realignment is triggered when the predictive correction, and hence the error in it, becomes larger than a desired maximum. This avoids unnecessary realignments but ensures that an alignment does occur when likely errors are out of permitted ranges.
申请公布号 US6788383(B1) 申请公布日期 2004.09.07
申请号 US20030624893 申请日期 2003.07.23
申请人 ASML NETHERLANDS BVV. 发明人 JEUNINK ANDRE;COMMISSARIS FRANK;LEMMEN VERA
分类号 G03F7/20;(IPC1-7):G03B27/42 主分类号 G03F7/20
代理机构 代理人
主权项
地址