发明名称 Method for microstructuring by means of locally selective sublimation
摘要 A method for microstructuring by means of locally selective sublimation is disclosed, whereby patterns or images of organic electroluminescent components are produced by application of low molecular weight emission material, provided on a support, to those points of substrate corresponding to the pattern or image for production, by means of sublimation. According to the invention, the method is carried out by firstly completely coating a film support made from temperature-resistant material with the emission material. The coated support and the substrate are then placed adjacent and parallel to each other in a vacuum chamber. The side of the support coated with the emission material faces the substrate. The support is subsequently locally heated for a short period of time on the non-coated side thereof in those positions corresponding to the pattern or image for generation, to a temperature adequate for the sublimation of the emission material.
申请公布号 US2006127565(A1) 申请公布日期 2006.06.15
申请号 US20050530255 申请日期 2005.10.19
申请人 NOKIA CORPORATION 发明人 BECKER EIKE;HEITHECKER DIRK;METZDORF DIRK;JOHANNES HERMANN H.;DOBBERTIN THOMAS;SCHNEIDER DANIEL;KOWALSKY WOLFGANG
分类号 B05D5/06;B05D5/12;H01L51/00;H01L51/30;H01L51/40 主分类号 B05D5/06
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