| 摘要 |
PURPOSE: Provide is method for forming a large-sized conductive pattern(or film) easily by using photosensitive metal nanoparticles, having thiol or isocyanide groups for self assembly on metal, without special sputtering or etching. CONSTITUTION: The nano-sized photosensitive metal particles, expressed by the formula, X-R-(A)a (X:HS or NC, R:C2-C50 organic group, A:OH, COOH, COCl or NH2 and a:integer of 1-4), are self assembly of thiol or isocyanide compound containing a terminal functional group(A) substituted with photosensitive group such as acryl, ethylene or diazo group, wherein the metal particles with a 1-30nm size are particles of metal such as Au, Ag, Cu, Pd or Pt, R is at least divalent organic group, having 2 to 10 carbon atoms, containing -CONH-, -COO-, -Si-, bis-porphyrin and/or -CO-, and the thiol compound is di-hydrochloride, 6-mercapto-1-hexanol, 4,4'-thiobiphenol, 2-mercaptoethanol, etc. The photosensitive composition for pattern formation comprises photosensitive metal nanoparticles, photoinitiator, organic solvent and optionally conductive(or non-conductive) polymer, wherein the conductive polymer is one or more of polyacetylene, polythiophene, polypyrrole and polyethylene dioxythiophene, the non-conductive polymer is one or more of polyester, polycarbonate, polyvinyl alcohol, polyvinyl butyral and polyamide, and the photoinitiator is acetophenone compound, benzoic compound, benzophenone compound, or 1-phenyl-1,2-propanedione-2-(O-ethoxycarbonyl)oxime. The conductive pattern is formed by coating a substrate(Si wafer) with photosensitive composition, drying the coated substrate, exposing the coated film with UV light through a patterned photomask.
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