| 摘要 |
PROBLEM TO BE SOLVED: To obtain an image having low fog and less liable to the rise of fog and a change in sensitivity in preservation before exposure and to obtain an image having high Dmax and optimum for use in a photomechanical process by incorporating at least two specified compounds on the side with an image forming layer. SOLUTION: The heat developable photosensitive material has a nonphotosensitive silver salt, photosensitive silver halide and a binder on the substrate and contains at least one compound of formula I and at least one compound of formula II on the side with an image forming layer containing the photosensitive silver halide. In the formula I, X0 is O or =NH, R1 and R2 are each H, acyl or the like and L1 is a divalent organic group required to form a cyclic structure. In the formula II, Z1 and Z2 are each halogen, X1 is H or an electron withdrawing group, Y1 is -CO- or -SO2-, Q is arylene or a divalent heterocyclic group, L is a combining group, W is carboxyl, its salt, sulfo, its salt or the like and (n) is 0 or 1.
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