发明名称 METHOD FOR PRODUCING ACID-DEGRADABLE RESIN HAVING ALICYCLIC GROUP, AND RESIST COMPOSITION CONTAINING THE ACID-DEGRADABLE RESIN
摘要 <P>PROBLEM TO BE SOLVED: To provide an acid-degradable resin imparting good properties to a resist composition and having an alicyclic group, and a method for producing the acid-degradable resin; and to provide the positive-type resist composition having excellent properties of having a wide process window and a small dependency on the pattern density by using the acid-degradable resin. <P>SOLUTION: The method for producing the acid-degradable resin having the alicyclic group involves a step for precipitating a solid resin by bringing a reaction solution containing the acid-degradable resin having the alicyclic group and obtained by a radical polymerization reaction into contact with a solvent in which the resin is slightly soluble or insoluble in an amount of <5 times as much as that of the reaction solution by volume. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005002236(A) 申请公布日期 2005.01.06
申请号 JP20030168029 申请日期 2003.06.12
申请人 FUJI PHOTO FILM CO LTD 发明人 SATO KENICHIRO
分类号 G03F7/039;C08F6/12;G03F7/26;H01L21/027 主分类号 G03F7/039
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