| 摘要 |
A manufacturing method of a thin-film magnetic head in which a magneto-sensitive portion is formed in a position where the width along the track-width direction is sufficiently small and a bias field from a bias means can be sufficiently received, and the influence of reattachments on reading output is avoided. The manufacturing method comprises steps of: forming an MR multilayer film comprising a foundation layer; a magneto-sensitive portion; and a cap layer of a material having an ion beam etching rate lower than that of a material of a free layer of the magneto-sensitive portion; and forming an MR effect multilayer by applying ion beam etching to the MR effect multilayer film by using a resist pattern as a mask in such a manner that an end point of the ion beam etching is below an upper surface of the lower electrode layer.
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