COPOLYMER FORMULATION FOR DIRECTED SELF-ASSEMBLY, METHODS OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME

摘要

Disclosed is a pattern forming method. The pattern forming method comprises the following steps of: arranging a composition on a substrate, wherein the composition includes a block copolymer including a first polymer and a second polymer, an additive polymer including a bottle brush polymer, and a solvent; and stimulating a separation of a region between the first polymer and the second polymer of the block copolymer by annealing the composition, and forming a periodic region formed from the first polymer and the second polymer. A vertical axis of the periodic region is parallel to the substrate. The first polymer and the second polymer are mutually different, and the block copolymer forms a phase separated structure. The bottle brush polymer has a lower or higher surface energy in comparison to the block copolymer. The composition achieves simple arrangement between domains, and hardly allows the ranges of polymers to be tightly adjusted.