| 摘要 |
An exposure apparatus (EX) is disclosed wherein an image of a pattern is projected onto a substrate (P) via a projection optical system (PL) and the substrate (P) is exposed to light. The exposure apparatus (EX) comprises a movable substrate stage (PST) for holding the substrate (P) above the projection optical system (PL), and an immersion unit (100) for filling at least a portion of the space between the projection optical system (PL) and the substrate (P) with a liquid (30). In this exposure apparatus (EX), an image of a pattern is projected onto the substrate (P) through the projection optical system (PL) and the liquid (30). With this structure, the exposure apparatus enables to suppress scattering of the liquid used for forming the immersion region, and carries out an exposure process of the substrate with a desired pattern accuracy without having the piping for supply and collection of the liquid obstruct the movement of the substrate stage.
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