发明名称 |
Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor |
摘要 |
A plasma processing chamber includes a cantilever assembly configured to neutralize atmospheric load. The chamber includes a wall surrounding an interior region and having an opening formed therein. A cantilever assembly includes a substrate support for supporting a substrate within the chamber. The cantilever assembly extends through the opening such that a portion is located outside the chamber. The chamber includes an actuation mechanism operative to move the cantilever assembly relative to the wall.
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申请公布号 |
US2008171444(A1) |
申请公布日期 |
2008.07.17 |
申请号 |
US20070653869 |
申请日期 |
2007.01.17 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
DHINDSA RAJINDER;LENZ ERIC H.;DESEPTE ANDY W.;LI LUMIN |
分类号 |
H01L21/3065 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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