| 摘要 |
This method for forming an electroconductive pattern is provided with: a lamination step for readying a photosensitive electroconductive film provided with a support film, an electroconductive layer including electroconductive fiber, and a photosensitive resin layer including a photosensitive resin, in the sequence listed, and laminating the electroconductive layer and the photosensitive resin layer so that the electroconductive layer is on a base material in intimate contact; and a patterning step for exposing and developing the photosensitive resin layer on the base material and thereby forming an electroconductive pattern. |
