Sulfonyl photoacid generators and photoresists comprising same

摘要

New bis(sulfonyl)imide and tri(sulfonyl)methide photoacid generator compounds (“PAGs”) are provided as well as photoresist compositions that comprise such PAG compounds.

主权项

1. A photoresist composition comprising a resin and a photoacid generator compound of the following Formula II: wherein W, Y are each independently hydrogen, fluorine, optionally substituted fluoroalkyl; optionally substituted fluoroalkoxy; or optionally substituted fluorocarbocyclic aryl; W′, Y′ are each independently the same as defined for W and Y; n and n′ are each the same or different and are each a positive integer; U and U′ are each the same or different and are each a linker; and R and R′ are each the same or different and are each an optionally substituted carboalicyclic, optionally substituted heteroalicyclic, optionally substituted carbocyclic aryl, or optionally substituted heteroaromatic group; X+ is a counter ion.