| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method improved to bring a light proximity effect compensating feature to a lithography. <P>SOLUTION: A gray scale light proximity effect compensating device feature conducts the convolution of a device feature and two-dimensional compensation kernel or two one-dimensional compensation kernel, added to a mask pattern by generating an OPC feature of the gray scale. The pattern obtained as a result can be used within a projection lithography device provided with a pattern forming means possible to program and fit to generate three or more strength levels. The best pattern for projection can be generated by simulating a space to be output by the pattern, comparing the simulation with an expected pattern and using a repetitive processing process adjusting the OPC features. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
