| 摘要 |
PURPOSE:To accurately position of a surface to be detected even if another pattern is formed on the surface to be detected when a position of a predetermined axial direction is detected on the surface to be detected from a lateral deviation of an image of a pattern of its brightness imaged by imaging means by projecting the pattern of the brightness obliquely to a predetermined axis on the surface to be detected. CONSTITUTION:A pattern of brightness is obliquely projected on a region 23 on a shot region to be exposed of a wafer 1. If a circuit pattern is formed in parallel with an X-axis and a Y-axis on the region 23, the wafer 1 is vibrated in a direction R to image an image of the pattern of the brightness of the region 23. |
