发明名称 |
Electroless palladium nitrate activation prior to cobalt-alloy deposition |
摘要 |
In one embodiment, a method for activating a metal layer prior to depositing a cobalt-containing capping layer is provided which includes exposing the metal layer to an electroless activation solution to deposit a palladium layer on the metal layer and depositing the cobalt-containing capping layer on the palladium layer. The electroless activation solution contains palladium nitrate at a concentration in a range from about 0.01 mM to about 1.0 mM, nitric acid at a concentration in a range from about 0.01 mM to about 3.0 mM and water. In another embodiment, the electroless activation solution contains palladium nitrate at a concentration in a range from about 0.01 mM to about 1.0 mM, methanesulfonic acid at a concentration in a range from about 0.01 mM to about 3.0 mM and water.
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申请公布号 |
US2005170650(A1) |
申请公布日期 |
2005.08.04 |
申请号 |
US20040970354 |
申请日期 |
2004.10.21 |
申请人 |
FANG HONGBIN;EMAMI RAMIN;WEIDMAN TIMOTHY;SHANMUGASUNDRAM ARULKUMAR;MEI FANG |
发明人 |
FANG HONGBIN;EMAMI RAMIN;WEIDMAN TIMOTHY;SHANMUGASUNDRAM ARULKUMAR;MEI FANG |
分类号 |
H01L21/302;H01L21/461;(IPC1-7):H01L21/302 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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