发明名称 Electroless palladium nitrate activation prior to cobalt-alloy deposition
摘要 In one embodiment, a method for activating a metal layer prior to depositing a cobalt-containing capping layer is provided which includes exposing the metal layer to an electroless activation solution to deposit a palladium layer on the metal layer and depositing the cobalt-containing capping layer on the palladium layer. The electroless activation solution contains palladium nitrate at a concentration in a range from about 0.01 mM to about 1.0 mM, nitric acid at a concentration in a range from about 0.01 mM to about 3.0 mM and water. In another embodiment, the electroless activation solution contains palladium nitrate at a concentration in a range from about 0.01 mM to about 1.0 mM, methanesulfonic acid at a concentration in a range from about 0.01 mM to about 3.0 mM and water.
申请公布号 US2005170650(A1) 申请公布日期 2005.08.04
申请号 US20040970354 申请日期 2004.10.21
申请人 FANG HONGBIN;EMAMI RAMIN;WEIDMAN TIMOTHY;SHANMUGASUNDRAM ARULKUMAR;MEI FANG 发明人 FANG HONGBIN;EMAMI RAMIN;WEIDMAN TIMOTHY;SHANMUGASUNDRAM ARULKUMAR;MEI FANG
分类号 H01L21/302;H01L21/461;(IPC1-7):H01L21/302 主分类号 H01L21/302
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