| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a multilayer film reflection mirror of low reflectance reduction, a manufacturing method therefor, and an exposure device using the multilayer film reflection mirror. <P>SOLUTION: A multilayer film can be formed while separating a substrate 81 distantly from plasma, by forming the multilayer film 83 on the substrate 81 with a magnetron spattering method using a superconductive manget, and the damage onto the film under the film formation is thereby reduced. A diffusion layer formed on a multilayer film interface can be thinned as a result, so as to provide the multilayer film reflection mirror 80 of low reflectance reduction. Exposure of high through-put can be also carried out by using the multilayer film reflection mirror 80 of high reflectance in an optical system of the exposure device. <P>COPYRIGHT: (C)2007,JPO&INPIT |
