发明名称 METHODS FOR THE FORMATION OF FULLY SILICIDED METAL GATES
摘要 An advanced gate structure that includes a fully silicided metal gate and silicided source and drain regions in which the fully silicided metal gate has a thickness that is greater than the thickness of the silicided source/drain regions is provided. Methods of forming the advanced gate structure are also provided.
申请公布号 US2009029515(A1) 申请公布日期 2009.01.29
申请号 US20080246921 申请日期 2008.10.07
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BIERY GLENN A.;STEEN MICHELLE L.
分类号 H01L21/336 主分类号 H01L21/336
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