发明名称 |
METHODS FOR THE FORMATION OF FULLY SILICIDED METAL GATES |
摘要 |
An advanced gate structure that includes a fully silicided metal gate and silicided source and drain regions in which the fully silicided metal gate has a thickness that is greater than the thickness of the silicided source/drain regions is provided. Methods of forming the advanced gate structure are also provided.
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申请公布号 |
US2009029515(A1) |
申请公布日期 |
2009.01.29 |
申请号 |
US20080246921 |
申请日期 |
2008.10.07 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BIERY GLENN A.;STEEN MICHELLE L. |
分类号 |
H01L21/336 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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