发明名称 METHOD FOR MAKING SLIT, SLIT, AND ELECTRON BEAM EXPOSURE SYSTEM
摘要 <p>A method for making a slit for shaping an electron beam into a desired shape, comprising a step for making grooves in the surface of a substrate, and a step for making through holes smaller than the bottom face of the groove in the bottom face of the grooves by anisotropic wet etching.</p>
申请公布号 WO2002063662(P1) 申请公布日期 2002.08.15
申请号 JP2002001068 申请日期 2002.02.08
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