发明名称 |
Laminate, conductive pattern, electrical circuit, and method for producing laminate |
摘要 |
The present invention provides a laminate in which at least a layer including a support, a primer layer, a first conductive layer, an insulating layer, and a second conductive layer are laminated, wherein the insulating layer is formed by coating at least a portion of or entirety of a surface of the first conductive layer with a resin composition and drying the resin composition; and the second conductive layer includes a second plating seed layer formed by coating a portion of or entirety of a surface of the insulating layer with a fluid containing a conductive substance, and a second plating layer formed on a surface of the second plating seed layer. This laminate has high adhesion between layers and allows the high adhesion to be maintained even upon exposure to a high-temperature and high-humidity environment. |
申请公布号 |
US9374895(B2) |
申请公布日期 |
2016.06.21 |
申请号 |
US201414762783 |
申请日期 |
2014.01.21 |
申请人 |
DIC CORPORATION |
发明人 |
Murakawa Akira;Shirakami Jun;Fujikawa Wataru;Saitou Yukie |
分类号 |
H05K1/03;H05K1/09;H05K3/46;H05K3/24;H05K3/38;C09D5/00 |
主分类号 |
H05K1/03 |
代理机构 |
McDermott Will & Emery LLP |
代理人 |
McDermott Will & Emery LLP |
主权项 |
1. A laminate in which at least a layer (A) including a support, a primer layer (B), a first conductive layer (C), an insulating layer (D), and a second conductive layer (E) are laminated, wherein the insulating layer (D) is formed by coating at least a portion of or entirety of a surface of the first conductive layer (C) with a resin composition (d) and drying the resin composition (d); the first conductive layer (C) includes a first plating seed layer (C-1) formed by coating a portion of or entirety of a surface of the primer layer (B) with a fluid (c-1) containing a conductive substance that is a transition metal or a compound of a transition metal, and a first plating layer (C-2) formed on a surface of the first plating seed layer (C-1); and the second conductive layer (E) includes a second plating seed layer (E-1) formed by coating a portion of or entirety of a surface of the insulating layer (D) with a fluid (e-1) containing a conductive substance that is a transition metal or a compound of a transition metal, and a second plating layer (E-2) formed on a surface of the second plating seed layer (E-1). |
地址 |
Tokyo JP |