| 摘要 |
A method for generating extreme ultraviolet radiation and soft x-ray radiation with a gas discharge operated on the left branch of the Paschen curve, in particular, for EUV lithography, wherein a discharge chamber ( 10 ) of a predetermined gas pressure and two electrodes ( 11, 12 ) are used, wherein the electrodes have an opening ( 14, 15 ), respectively, positioned on the same symmetry axis ( 13 ) and, in the course of a voltage increase ( 16 ) upon reaching a predetermined ignition voltage (U<SUB>z</SUB>), generate a plasma ( 17 ) located in the area between their openings ( 14, 15 ), which plasma is a source of the radiation ( 17 ') to be generated, wherein an ignition of the plasma ( 17 ) is realized by affecting the gas pressure and/or by triggering, and wherein, with the ignition of the plasma ( 17 ), an energy storage device supplies by means of the electrodes ( 11, 12 ) stored energy into the plasma ( 17 ), characterized in that the ignition of the plasma ( 17 ) is realized by using a predetermined ignition delay ( 18 ).
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