| 摘要 |
PROBLEM TO BE SOLVED: To provide a light reflection type lithography mask reduced in projection effect, a method of manufacturing the same, a method of producing mask data, and a mask blank.SOLUTION: The light reflection type lithography mask includes a substrate, and a reflection layer. The reflection layer is provided on the substrate, and has a first pattern and a second pattern in a top face view thereof. The second pattern is provided at a position nearest to at least any one of one side of the first pattern and the other side of the first pattern. The reflectivity of a part provided with the first pattern is different from a reflectivity of a part provided with the second pattern.SELECTED DRAWING: Figure 1 |
