| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of preventing immersion exposure liquid from relatively deeply entering under a substrate. <P>SOLUTION: There are provided a projection system for projecting radiation beam, to which a pattern is given, on a target portion of a substrate W; a substrate holding part WH for holding the substrate W; a discharge port 24 for reducing a pressure of a space between the substrate W and the substrate holding part WH; a liquid supply system for supplying liquid 11 to the space between the projection system and the substrate holding part WH; and a gas supply port 22 provided so as to be positioned in the vicinity of the lower surface of a substrate edge when the substrate W is held by the substrate holding part WH, wherein the gas supply port 22 supplies gas to the space between the substrate W and the substrate holding part WH so that the supplied liquid 11 does not substantially enter under the substrate W. <P>COPYRIGHT: (C)2007,JPO&INPIT |
