| 摘要 |
A hard film formed by an arc-discharge ion-plating method, having a composition comprising metal components represented by Al<SUB>x</SUB>Cr<SUB>1-x-y</SUB>Si<SUB>y</SUB>, wherein x and y are respectively atomic ratios meeting. 0.45<=x<=0.75, 0<=y<=0.35, and 0.5<=x+y<1, and non-metal components represented by N<SUB>1-alpha-beta-gamma</SUB>B<SUB>alpha</SUB>C<SUB>beta</SUB>O<SUB>gamma</SUB>, wherein alpha, betaand gamma are respectively atomic ratios meeting 0 <=alpha<=0.15, 0<=beta<=0.35, and 0.003<=gamma<=0.25, the hard film having an NaCl-type crystal structure, with a half width of 2theta at an X-ray diffraction peak corresponding to a (111) face or a (200) face being 0.5-2.0°, and the hard film containing oxygen more in grain boundaries than in crystal grains.
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